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F300 High-Frequency Low-Loss Film
F · Series
F · Series · Packaging Dielectric

F300 High-Frequency Low-Loss Film

Low-loss, high-Tg film for high-speed interconnect and advanced package substrate evaluation.

10~100 μm
Thickness range
175~202 ℃
Tg range
0.0045~0.018
Df @5GHz
Product Position

A base material platform for package substrate build-up insulation

The F series supports FC-BGA, Chiplet and AI server package substrates, from standard insulation to low-loss and low-CTE stack-ups.

Recommended use

The F series supports FC-BGA, Chiplet and AI server package substrates, from standard insulation to low-loss and low-CTE stack-ups.

Process evaluation

Evaluation should cover lamination flow, laser drilling, copper plating adhesion, reflow resistance and insulation reliability after humidity stress.

Series logic

Evaluation should cover lamination flow, laser drilling, copper plating adhesion, reflow resistance and insulation reliability after humidity stress.

Inputs to prepare

Target dielectric thickness / Line/space and layer count / Lamination and reflow conditions

Key Data

Key data ranges

Detailed process conditions, test methods and full parameter items should be confirmed during sample evaluation.

Thickness range
10~100 μm
Tg range
175~202 ℃
Df @5GHz
0.0045~0.018
CTE range
19~40 ppm/K

* Values are indicative key ranges. Full test items, conditions, sample batches and process environments should be confirmed through sample evaluation and formal documents.